By L. F. , C. G. Willson, and J. M. J. Frechet, editors Thompson

content material: primary limits of lithography / T.E. Everhart --
sensible and basic points of lithography / A.N. Broers --
A viewpoint on withstand fabrics for fine-line lithography / M.J. Bowden --
primary radiation chemistry : primary elements of polymer degradation by means of high-energy radiation / D.J.T. Hill, J.H. O'Donnell, and P.J. Pomery --
Pulse radiolysis reviews at the mechanism of the excessive sensitivity of chloromethylated polystyrene as an electron unfavourable face up to / Y. Tabata, S. Tagawa, and M. Washio --
Photochemistry of ketone polymers within the stable section : a overview / J.E. Guillet, S.-K.L. Li, and H.C. Ng --
Radiolysis of poly(isopropenyl t-butyl ketone) / S.A. Macdonald, H. Ito, C.G. Willson, J.W. Moore, H.M. Gharapetian, and J.E. Guillet --
Polymer-bonded electron-transfer sensitizers / S. Tazuke, R. Takasaki, Y. Iwaya, and Y. Suzuki --
Laser-induced polymerization / C. Decker --
Novel synthesis and photochemical response of the polymers with pendant photosensitive and photosensitizer teams / T. Nishikubo, T. Iizawa, and E. Takahashi --
a singular approach for deciding on radiation chemical yields of unfavorable electron-beam resists / A. Novembre and T.N. Bowmer --
Anomalous topochemical photoreaction of olefin crystals / M. Hasegawa, ok. Saigo, and T. Mori --
The photo-Fries rearrangement and its use in polymeric imaging structures / T.G. Tessier, J.M.J. Frechet, C.G. Willson, and H. Ito --
Soluble polysilane derivatives : attention-grabbing new radiation-sensitive polymers / R.D. Miller, D. Hofer, D.R. McKean, C.G. Willson, R. West, and P.T. Trefonas, III --
instruction and backbone features of a singular silicone-based destructive withstand / A. Tanaka, M. Morita, S. Imamura, T. Tamamura, and O. Kogure --
Positive-working electron-beam resists in response to maleic anhydride copolymers / K.U. Pohl, F. Rodriguez, Y.M.N. Namaste, and S.K. Obendorf --
Functionally substituted Novolak resins : lithographic functions, radiation chemistry, and photooxidation / H. Hiraoka --
Synthesis, characterization and lithographic review of chlorinated polymethylstyrene / R. Tarascon, M. Hartney, and M.J. Bowden --
Photochemistry of ketone polymers within the reliable section : skinny movie stories of vinyl ketone polymers / J.E. Guillet, S.-K.L. Li, S.A. Macdonald, and C.G. Willson --
Polymers of [alpha]-substituted benzyl methacrylates and aliphatic aldehydes as new varieties of electron-beam resists / ok. Hatada, T. Kitayama, Y. Okamoto, H. Yuki, H. Aritome, S. Namba, okay. Nate, T. Inoue, and H. Yokono --
Radiation chemistry of phenolic resin containing epoxy and azide compounds / H. Shiraishi, T. Ueno, O. Suga, and S. Nonogaki --
natural direct optical recording media / L. Alexandru, M.A. Hopper, R.O. Loutfy, J.H. Sharp, P.S. Vincett, G.E. Johnson, and K.Y. legislations --
fundamental and secondary reactions in photoinitiated free-radical polymerization of natural coatings / A. Hult and B. Ranby --
Radiation balance of silicon elastomers / G.C. Corfield, D.T. Astill, and D.W. Clegg.

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Additional info for Materials for Microlithography. Radiation-Sensitive Polymers

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For example, if G (scission) < 4 G (cross-linking) the sample will always cross-link. The presence of aromatic groups in the polymer chain would be expected to lead to increased radiation stability and hence to improved resistance to dry etching environments. Unfortunately the lithographic sensitivity of resists designed to respond to high-energy radiation is adversely affected because of the radiation protective effect of such groups, suggesting that a compromise between the two requirements must be made.

Lin, B. J. "Microcircuit Engineering 81"; Swiss Federal Instit. : Lausanne, Switzerland, 1981, 47. 3. Hershel, R. SPIE Conference, Santa Clara, California, 1982. 4. Offner, A. Photogr. Sci. Eng. 1979, 23, 374. 5. King, M. C. ; Academic Press: 1981; Chapt. , Vol. 1&2. 6. Lin, B. J. ,1979, 174. 7. Tai, K. L. J. Vac. Sci. Technol. 1979, 216, 1977. 8. Markle, D. A. Solid State Tech. 1984, 217, 50. 9. Greed, J. ; Markle, D. A. , Santa Clara, California, 1982. ; ACS Symposium Series; American Chemical Society: Washington, DC, 1985.

Transmission scanning electron micrograph of two nanobridge SQUID's (Superconducting Quantum Interference Devices). A SQUID consists of a superconducting ring containing two weak-links'. In this instance, the weak links are niobium wires 25 nm wide fabricated by electron beam. ; ACS Symposium Series; American Chemical Society: Washington, DC, 1985. 2. 35 Practical and Fundamental Aspects of Lithography BROERS Typically a hundred times this exposure is needed to reduce the uncertainty to an acceptable level of <5%.

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